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Trump halts new student visa appointments globally
Students stroll across Harvard University campus in Cambridge, Massachusetts, US, April 15, 2025.
The Trump administration has directed U.S. embassies and consulates to stop scheduling new appointments for student and exchange visitor visas while updating guidelines for expanded social media screening of applicants.
An internal State Department cable, issued by Secretary of State Marco Rubio, instructs diplomatic missions to pause booking new F, M, and J visa appointments until the review is completed. The updated vetting process will involve closer scrutiny of applicants’ social media activities.
Appointments already booked can proceed under current rules, but any available but unscheduled slots must be removed. The new measures will require consular sections to adjust their operations and resource management.
This action is part of the administration’s broader immigration policy aimed at increasing deportations and revoking visas for those deemed a security risk. Officials have indicated that visa holders expressing support for Palestinians or criticism of Israel’s actions in Gaza may face deportation for threatening U.S. foreign policy.
Critics argue this policy threatens free speech protections. Protests have taken place at several universities, where students and faculty oppose the administration’s moves against foreign students and its efforts to cut university funding.
A Turkish student detained for over six weeks after co-authoring an opinion piece critical of her school’s response to the Gaza conflict was recently released on bail following a court decision.
Additionally, the administration has sought to block Harvard University from enrolling international students. Around 27% of Harvard’s student population is international, and the university has resisted government demands for policy changes.
Officials maintain that the expanded vetting is necessary for national security and that all visa applicants will be thoroughly assessed before entry is permitted.